Advanced Process Control (APC) Software for Fabs
Real-time inference across every tool in the fab
- R2R control
- Multivariate SPC
- Etch
- Deposition
- Lithography
Industry
Semiconductor Fabs
Process control that watches every tool and adjusts every recipe in real time.
A fab is the most sensor-dense environment on earth. Drift on one etch chamber shows up weeks later as yield loss on a wafer nobody can trace back. We build the inference layer that sees the drift as it starts and corrects the recipe before the next lot.
What we see
- Equipment drift across etch, deposition, and lithography that only surfaces as yield loss
- Manual recipe tuning that cannot keep pace with 10,000+ sensor points per second
- Unplanned tool downtime in a facility that runs around the clock
What we bring
Electronic Design Automation (EDA) for Advanced Nodes
From RTL to a mask-ready GDSII at 3nm
- RTL
- GDSII
- DRC/LVS
- GAAFET
- 3nm
- 5nm
How we help
What we bring to fabs.
The systems this industry draws on, layer by layer.
01
Advanced Process Control
A distributed, real-time inference engine that ingests 10,000+ sensor data points per second from fab tools (etch, deposition, lithography).
What we build02
EDA for Advanced Nodes
A suite of algorithms that convert RTL (Register-Transfer Level) code into a physical GDSII file ready for mask generation.
What we buildBring us the whole stack.
Tell us where latency is costing you, from the die to the data center to the control room. An architect replies with a first read of the problem, not a sales deck.